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Título : | Optical and Structural Characterization of ZnO Films Deposited by Chemical Bath and Activated by means of Microwaves |
Autor : | Diaz Reyes, Joel |
Palabras clave : | ZnO, Wide band semiconductor, Chemical bath technique, X-Ray, IR, Raman spectroscopy. |
Fecha de publicación : | 27-nov-2012 |
Resumen : | Abstract. Zinc oxide (ZnO) is a direct, wide band gap semiconductor material having many promising properties for UV/blue optoelectronics, transparent electronics, spintronic devices and sensor applications. The ZnO is synthesized by the technique of Chemical Bath Deposition by microwaves heating (MW-CBD). The urea concentration in the solution is varied, maintaining constant the zinc nitrate in ratio 1:1 ... 1:10. The physical properties of ZnO thin films were examined by X-ray diffraction (XRD), SEM-EDS, and Raman scattering, which are convenient tools that can provide us with plenty of information about crystal structure and elementary excitons. By X-rays one obtains that it has hexagonal po1ycrystalline wurtzite type structure. The IR absorpt i on line at 3577 cm•1 detected at 300 K in bath chemical ZnO is assigned an 0-H bond primarily aligned with the c-axis ofthe crystal and bonding between Zn-0 (473cm- 1 , 532 cm- 1 ). The Raman spectra show the first order experimental Raman spectra of ZnO excited by 514.5 nm laser line. The first order Raman modes A 1T' E 1 T' E/H), A 1 Land E 1 L are identified as the peaks sited at 385, 426, 437, 572 and 584 cm•1 |
Descripción : | article |
URI : | http://www.repositoriodigital.ipn.mx/handle/123456789/8594 |
Aparece en las colecciones: | Artículos |
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